| 摘要 |
<p>PURPOSE: The pattern error of the wafer pattern is detected more precisely to the image matching in which the pattern error-detection method of the semiconductor device uses the image embodying of pattern on wafer. CONSTITUTION: For the part in which for the goal layout and wafer pattern image, difference are fundamentally healed, the goal layout is included. The layout of the target pattern and simulation contours(240, 250) is piled up one and the curved portion of the simulation contour is somebody/something understood made in the straight line.</p> |
