发明名称 SOLID-STATE IMAGING ELEMENT AND METHOD OF MANUFACTURING THE SAME, AND IMAGING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a solid-state imaging element which is easily manufactured by facilitating control over a lens shape, and has excellent characteristics of sensitivity etc. <P>SOLUTION: The solid-state imaging element includes a light reception part 2 formed in a semiconductor substrate 1, an insulating layer 9 formed on the semiconductor substrate 1, a film 11 formed by coating outside an inner part of a hole part formed in an insulating layer 9 above the light reception part 2 and constituting a clad part of a waveguide 10 together with the insulating layer 9, a core part 12 of the waveguide 10 made of a material having a higher refractive index than the material of the insulating layer 9 and the material of the film 11 formed by the coating, and formed inside the inner part of the hole part, and an in-layer lens having a lens surface 10A formed of an interface between the film 11 formed by the coating and the core part 12 at a bottom part of the hole part, and united with the waveguide 10. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010287676(A) 申请公布日期 2010.12.24
申请号 JP20090139352 申请日期 2009.06.10
申请人 SONY CORP 发明人 MATSUTANI HIROYASU
分类号 H01L27/14;H04N5/335;H04N5/369 主分类号 H01L27/14
代理机构 代理人
主权项
地址