| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a reflective mask preventing reduction in volume of a deposition film (a white defect repairing position) by contamination cleaning, and to provide a method of manufacturing the reflective mask. <P>SOLUTION: The reflective mask includes a substrate, a multilayer film formed on the substrate, and an absorber patterned on the multilayer film. The absorber includes an absorption layer, and the deposition film formed in a white defect part due to a lack of the absorption layer. The deposition film contains five atomic percentage or more of metals serving as ion sources of focused ion beams. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
