METHOD FOR MANUFACTURING FINE PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for manufacturing a highly accurate fine pattern, the method transferring a fine pattern even in exposure after releasing the fine pattern from a mold and even when the mold and a substrate do not have transparency to active light. SOLUTION: The method for manufacturing the fine pattern includes: a molding step of pressing a mold 105 having a fine pattern against a photosensitive resin layer laminated on a substrate to form the fine pattern on the photosensitive resin layer; a releasing step of releasing the mold 105 from the photosensitive resin layer; and an exposure step of exposing the photosensitive resin layer to active light under inert gas to cure the photosensitive resin layer. The photosensitive resin layer contains at least a radical polymerization type photosensitive resin composition, of which the viscosity at 20°C is 106to 1011Pa s. COPYRIGHT: (C)2011,JPO&INPIT