发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, PROGRAM, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus, a substrate processing method, a program, and a storage medium for recovering an extended amount of discharged solution when recovering and reusing the discharged solution discharged from a processing unit, and thereby reducing the amount of purified water to be used to lower the cost. SOLUTION: The substrate processing apparatus includes first and second discharge solution lines 42b and 44b each branched and connected to the downstream side of a discharge unit 40, and the discharged solution from each of the first and second discharge solution lines 42b and 44b is independently delivered to a processing solution supply unit 30 as a recovered solution. Also, the substrate processing apparatus includes a converting unit 41 that converts flow of the discharged solution from the discharge unit 40 either to the first discharge solution line 42b or to the second discharge solution line 44b. The processing solution supply unit 30 selectively delivers the recovered solution from the first and second discharge solution lines 42b and 44b to the processing unit 10. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010287591(A) 申请公布日期 2010.12.24
申请号 JP20090137892 申请日期 2009.06.09
申请人 TOKYO ELECTRON LTD 发明人 SATO HIDEAKI
分类号 H01L21/304 主分类号 H01L21/304
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