| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target material which is used as a soft magnetic layer of a perpendicular magnetic recording medium for producing an amorphous thin film and shows a high PTF value, and to provide a raw material powder having a low saturation magnetic flux density. SOLUTION: The sputtering target material for producing a soft magnetic thin film containing Fe, Ni, and Zr is prepared by solidifying and forming a raw material powder which contains, in atom%,≤6% Co, 1-20% Zr,≤20% Hf,≤20% Nb and≤20% Ta, the balance being Fe, Ni, and inevitable impurities, wherein the following formulas are satisfied: 0.25≤[Ni%/(Fe%+Ni%)]-0.011×(Zr%+Hf%+Nb%+Ta%)≤0.35 and Zr+Hf+Nb+Ta≤20%. The amounts of Co, Hf, Nb, and Ta include 0%. The sputtering target material is obtained by forming the raw material powder. COPYRIGHT: (C)2011,JPO&INPIT |
