发明名称 PROJECTION OPTICAL APPARATUS, EXPOSURE UNIT, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To improve throughput associated with scan exposure of a belt-like photosensitive substrate carried, for example, in a roll-to-roll manner during application to the scan exposure. <P>SOLUTION: A projection optical apparatus forms a projection image of a predetermined region (IR) on a first surface (OBJ) on a first region (ER1) and a second region (ER2) on a surface (IMG) different from the first surface. The projection optical apparatus includes a lens group (Lp) on which light from the predetermined region is made incident, a time-division reflection parts (10: 11, 12) which time-divides light from the lens group into first light and second light traveling in different directions across the optical axis of the lens group, and reflects the first light and second light toward the lens group, a first light guide optical system (G1) which guides the first light passed through the lens group to the first region, and a second light guide optical system (G2) which guides the second light passed through the lens group to the second region. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010287643(A) 申请公布日期 2010.12.24
申请号 JP20090138797 申请日期 2009.06.10
申请人 NIKON CORP 发明人 KIUCHI TORU;MIZUTANI HIDEO
分类号 H01L21/027;G02B7/198;G02B17/08;G03F7/20 主分类号 H01L21/027
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