发明名称 APPARATUS AND METHOD FOR PLASMA TREATMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide an apparatus and a method for plasma treatment capable of reducing particles generated due to an inner potential of an inner cylinder disposed inside of a vacuum container. <P>SOLUTION: The plasma treatment apparatus has, inside of a metal vacuum chamber 11, the inner cylinder 15 made of surface-alumited aluminum and a substrate disposed in a plasma diffusion region, and performs plasma treatment. A plurality of protruding portions 15a in point-contact with the vacuum chamber 11 is provided on a lower end portion of the inner cylinder 15, and an alumite film 16 on a leading end portion 15b of each of the protruding portion 15a is removed so as to electrically connect the inner cylinder to the vacuum chamber 11. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2010285650(A) 申请公布日期 2010.12.24
申请号 JP20090139795 申请日期 2009.06.11
申请人 MITSUBISHI HEAVY IND LTD 发明人 MATSUDA RYUICHI;YOSHIDA KAZUTO;KONO YUICHI
分类号 C23C16/44;H01L21/3065;H01L21/31 主分类号 C23C16/44
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