发明名称 Graphene wafer, method for manufacturing the graphene wafer, method for releasing a graphene layer, and method for manufacturing a graphene device
摘要 A method is used for releasing a graphene layer from a substrate. A graphene layer is first formed on a surface of a first substrate. A metal layer is then formed on a surface of the graphene layer. A pulling force is then applied to the metal layer to detach the graphene layer from the first substrate. The released graphene layer is bonded by intermolecular force onto a surface of a second substrate separate from the first substrate or onto a surface of a bonding layer formed on the surface of the second substrate. The metal layer is then removed, by for example, etching.
申请公布号 US2010323164(A1) 申请公布日期 2010.12.23
申请号 US20100801720 申请日期 2010.06.22
申请人 OKI DATA CORPORATION 发明人 OGIHARA MITSUHIKO;SAGIMORI TOMOHIKO;SAKUTA MASAAKI;HASHIMOTO AKIHIRO;TANAKA SATORU
分类号 B32B3/26;B32B38/10;C01B31/04 主分类号 B32B3/26
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