PATTERN PROCESSING DEVICE, METHOD THEREFOR, AND PROGRAM

摘要

When a change occurs at a local region, decrease of recognition accuracy and detection accuracy can be suppressed. To this end, a pattern processing device is provided with a reference local region setting unit (1802) which sets a reference local region on the basis of a feature point detection result by a face part feature point detection unit (101); a variant local region generation unit (1803) which generates a plurality of variant local region patterns with reference to a surrounding image region of the reference local region; a similarity calculation unit (106) for obtaining similarities among the input pattern and the registered pattern of the reference local region and the plurality of variant local region patterns; a representative similarity calculation unit (107) for obtaining a representative similarity from the similarities; and a determination unit (109) which determines a class to which the input pattern belong on the basis of the representative similarity.