发明名称 ALIGNMENT METHOD, ALIGNMENT DEVICE, AND EXPOSURE DEVICE
摘要 <p>An alignment method comprises the steps of: while transferring a substrate equipped with patterns arranged in a matrix, sequentially processing a plurality of images captured at constant time intervals by an image capturing means having a plurality of light receiving elements aligned in a direction substantially orthogonal to the transfer direction of the substrate and detecting the positions where the brightness changes in the aligned direction of the light receiving elements; adding, in the substrate transfer direction, the number of brightness changes detected at the same position while the substrate moves a certain distance and obtaining the data of a plurality of number of edges; identifying, from the data of the number of edges that exceeds a predetermined threshold value, the positions of a plurality of long sides parallel to the transfer direction of the patterns; calculating the midpoint positions of a plurality of adjacent pairs of the long sides and selecting, from the midpoint positions of the adjacent pairs, a midpoint position close to a target position preset in the image capturing means; calculating the amount of the position shift between the selected midpoint position and the target position in the image capturing means; and moving a photo mask in a direction substantially orthogonal to the transfer direction of the substrate so that the amount of the position shift becomes a predetermined value.</p>
申请公布号 WO2010147019(A1) 申请公布日期 2010.12.23
申请号 WO2010JP59644 申请日期 2010.06.08
申请人 V TECHNOLOGY CO., LTD.;IWAMOTO, TAKAMITSU 发明人 IWAMOTO, TAKAMITSU
分类号 G03F9/00;H01L21/027 主分类号 G03F9/00
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