| 摘要 |
An exemplary film coating apparatus includes a housing, a holder for holding a workpiece, and a coating source. The housing defines a chamber therein. The holder and the coating source are received in the chamber. The coating source includes a supporting plate and a number of gas jetting heads. The supporting plate includes a first surface facing the holder, and defines a receiving recess at the first surface configured for receiving a target material, and a number of through holes. The gas jetting heads are capable of introducing one or more gases into the chamber, each gas jetting head passes through one respectively through hole and is fixed in the through hole.
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