发明名称 APPARATUS AND METHOD FOR MEASURING THE POSITION OF PELLICLE ON PHOTOMASK
摘要 <p>PURPOSE: The pellicles mounting location measure system of photomask and method of measurement using the same automatically measures distance to pellicle from the edge of photomask by using the robot arm. CONSTITUTION: The stage(210) supports the photomask(100) in which the pellicle(120) is attached. Transport units are arranged in on the stage. The transport unit is arranged to photomask in order to mobile. It is attached to the end part of the transport unit and detecting apparatuses(231, 232, 233, 234) detect the contact whether or not with pellicle.</p>
申请公布号 KR20100134453(A) 申请公布日期 2010.12.23
申请号 KR20090053078 申请日期 2009.06.15
申请人 HYNIX SEMICONDUCTOR INC. 发明人 SEO, KANG JOON
分类号 H01L21/027;H01L21/66 主分类号 H01L21/027
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