RADIATION-SENSITIVE RESIN COMPOSITION

摘要

Disclosed is a radiation-sensitive resin composition which contains (A) a resin that contains an acid-cleavable group and (C) a compound that is represented by general formula (i). (In general formula (i), R1 represents a hydrogen atom or the like; R2 represents a single bond or the like; R3 represents a linear monovalent hydrocarbon group having 1-10 carbon atoms, wherein some or all of the hydrogen atoms may be substituted by fluorine atoms, or the like; and X+ represents an onium cation.)