发明名称 |
APPARATUS FOR WETTING PRETREATMENT FOR ENHANCED DAMASCENE METAL FILLING |
摘要 |
Disclosed are pre-wetting apparatus designs and methods. These apparatus designs and methods are used to pre-wet a wafer prior to plating a metal on the surface of the wafer. Disclosed compositions of the pre-wetting fluid prevent corrosion of a seed layer on the wafer and also improve the filling rates of features on the wafer.
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申请公布号 |
US2010320081(A1) |
申请公布日期 |
2010.12.23 |
申请号 |
US20100684792 |
申请日期 |
2010.01.08 |
申请人 |
MAYER STEVEN T;PORTER DAVID W;WILLEY MARK J |
发明人 |
MAYER STEVEN T.;PORTER DAVID W.;WILLEY MARK J. |
分类号 |
C25B9/00;B08B3/00 |
主分类号 |
C25B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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