发明名称 WAFER PROCESSING SHEET
摘要 The present invention relates to a wafer processing sheet. The present invention provides a wafer processing sheet which is excellent in heat resistance and dimensional stability, and which has superior stress relaxation property to prevent a wafer from being damaged or delimited by residual stresses or a non-uniform pressure, and which has superior cutting property. In addition, the present invention provides a sheet which can effectively suppress a blocking phenomenon during a wafer processing process or the like. Consequently, a base of the present invention can be valuably used as a processing sheet in a variety of wafer processing processes including dicing, back grinding, picking-up and so on.
申请公布号 WO2010147363(A2) 申请公布日期 2010.12.23
申请号 WO2010KR03836 申请日期 2010.06.15
申请人 LG CHEM, LTD.;KIM, SE RA;JOO, HYO SOOK;CHANG, SUK KY;SHIM, JUNG SUP 发明人 KIM, SE RA;JOO, HYO SOOK;CHANG, SUK KY;SHIM, JUNG SUP
分类号 H01L21/302 主分类号 H01L21/302
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