发明名称 Integrated handling system for semiconductor articles
摘要 Methods and apparatuses for integrated cleaning of objects comprising a sequence of wet cleaning and vacuum drying in a same process chamber. The present integrated cleaning process can eliminate moving parts, improving the system reliability. Vacuum decontamination can be included for degassing and decontaminating the cleaned objects. In an embodiment, a cleaner system combines various movements into an integrated movement to be handled by a robot, for example, to improve the throughput. For example, an integrated robot movement comprising picking up a closed container from the input load port, moving both the lid and body together, and then depositing the body and lid separately into the appropriate positions in the cleaner to be cleaned.
申请公布号 US2010319733(A1) 申请公布日期 2010.12.23
申请号 US20100817310 申请日期 2010.06.17
申请人 DYNAMIC MICRO SYSTEMS, SEMICONDUCTOR EQUIPMENT GMBH 发明人 REBSTOCK LUTZ
分类号 B65G49/00;B08B5/04 主分类号 B65G49/00
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