发明名称 |
High-resolution overlay alignement methods and systems for imprint lithography |
摘要 |
<p>A system for forming a pattern on a substrate using a patterned template comprising a support configured to hold the patterned template during use, a template adjustment device coupled to the support, wherein the template adjustment device is configured to alter the size of the template during use.</p> |
申请公布号 |
EP2264524(A2) |
申请公布日期 |
2010.12.22 |
申请号 |
EP20100183242 |
申请日期 |
2001.07.16 |
申请人 |
THE BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM |
发明人 |
CHOI, BYUNG, JIN;COLBURN, MATTHEW;SREENIVASAN, S., V.;BAILEY, TODD |
分类号 |
G02B5/18;G03F7/00;B29C35/08;B29C37/00;G03F7/20;G03F9/00;H01L21/027 |
主分类号 |
G02B5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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