A method of forming a pattern on a substrate in imprint lithographic processes

摘要

A method of forming a pattern on a substrate using a patterned template that is substantially transparent to curing light comprising: applying a light curable liquid to a portion of the substrate, wherein the light curable liquid is curable in the presence of curing light, determining the alignment of the template alignment mark with respect to the substrate alignment mark, adjusting the overlay placement of the patterned template with respect to the substrate such that the template alignment mark and the substrate alignment mark are substantially aligned, applying activating light through the template to the liquid, wherein the application of activating light substantially cures the liquid, and wherein a pattern of the patterned template is formed in the cured liquid, and separating the patterned template from the cured liquid, wherein adjusting the overlay placement comprises altering the dimensions of the patterned template.