<p>A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.</p>
申请公布号
EP2264522(A2)
申请公布日期
2010.12.22
申请号
EP20100181839
申请日期
2001.07.16
申请人
THE BOARD OF REGENTS OF THE UNIVERSITY OF TEXAS SYSTEM