APPARATUS FOR THIN LAYER DEPOSITION

摘要

PURPOSE: A thin film deposition device is provided to improve a manufacturing yield and deposition efficiency by being easily applied to a large scale substrate production process. CONSTITUTION: A deposition source part(110) radiates a deposition material. A first nozzle(120) is arranged in one side of the deposition source part. The first nozzle comprises a plurality of first slits formed along a first direction. A second nozzle(150) faces the deposition source part. The second nozzle comprises a plurality of second slits formed along the first direction. A barrier wall assembly(130) is arranged between the first nozzle and the second nozzle along the first direction. The barrier wall assembly comprises a plurality of barrier walls dividing a space between the second nozzle and the first nozzle into a plurality of deposition spaces. A correction plate(190) secludes at least a part among deposition materials radiated from the deposition source part between the first and the second nozzle.