| 摘要 |
<p>PURPOSE: A photoresist composition containing salts is provided to obtain photoresist pattern with excellent line edge roughness and focus margin(DOF). CONSTITUTION: A salt represented by the formula (a1), wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group, X1 represents -CO-O-X^a1- or -CH2-O-X^a2- wherein X^a1 and X^a2 independently each represent a C1-C15 alkylene group and one or more -CH2- in the alkylene group can be replaced by -O- or -CO-, Y1 represents a C3-C36 alicyclic hydrocarbon group or a C6-C24 aromatic hydrocarbon group, and the alicyclic hydrocarbon group and the aromatic hydrocarbon group can have one or more substituents, and one or more -CH2- in the alicyclic hydrocarbon group can be replaced by -O- or -CO-, an Z^+ represents an organic cation.</p> |
