| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an abrasive material supplying device for reducing polishing flaws on a surface to be polished. Ž<P>SOLUTION: The abrasive material supplying device 10 is equipped with an abrasive material tank 11 for storing abrasive material, a peristaltic pump 13 for feeding a constant amount of the abrasive material 9 supplied from the abrasive material tank to an abrasive material supplying passage 15c, a switching valve 14 provided at the abrasive material supplying passage, and a waste liquid passage 16 diverging from the abrasive material supplying passage through the switching valve. Ž<P>COPYRIGHT: (C)2006,JPO&NCIPI Ž</p> |
