发明名称 Corrosion inhibitor additives to prevent semiconductor device bond-pad corrosion during wafer dicing operations
摘要 An improved method of dicing a semiconductor wafer which substantially reduces or eliminates corrosion of copper-containing, aluminum bonding pads. The method involves continuously contacting the bonding pads with deionized water and an effective amount of a copper corrosion inhibiting agent, most preferably benzotriazole. Also disclosed, is an improved apparatus for dicing a wafer, in which a copper corrosion inhibiting agent is included in the cooling system for cooling the dicing blade.
申请公布号 US7855130(B2) 申请公布日期 2010.12.21
申请号 US20030249576 申请日期 2003.04.21
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CADIEUX ROBERT R;ESTES SCOTT A;KRYWANCZYK TIMOTHY C
分类号 H01L21/78;B28D5/00;B28D5/02;H01L21/301;H01L21/46 主分类号 H01L21/78
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