发明名称 Wirebond structure and method to connect to a microelectronic die
摘要 A wirebond structure includes a copper pad formed on or in a surface of a microelectronic die. A conductive layer is included in contact with the copper pad and a bond wire is bonded to the conductive layer. The conductive layer is formed of a material to provide a stable contact between the bond wire and the copper pad in at least one of an oxidizing environment and an environment with temperatures up to at least about 350° C.
申请公布号 US7855103(B2) 申请公布日期 2010.12.21
申请号 US20080127584 申请日期 2008.05.27
申请人 INTEL CORPORATION 发明人 GLEIXNER ROBERT J.;DANIELSON DONALD;PALUDA PATRICK M.;NAIK RAJAN
分类号 H01L21/50;H01L21/44;H01L21/461;H01L21/48;H01L21/603;H01L23/485 主分类号 H01L21/50
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