发明名称 PHOTOSENSITIVE TRANSPARENT RESIN COMPOSITION, PROCESS FOR PRODUCTION OF COLOR FILTERS, AND COLOR FILTERS
摘要 With the objective of providing a photosensitive transparent resin composition that is reduced in the exposure illuminance dependency, allows high residual film ratio and little development scum and can stably form a pattern with good resolution, a color filter ensuring little decrease in the transmittance for visible light and enabling display of a high-quality definite image, and a production method thereof, there is provided a photosensitive transparent resin composition containing at least a polymerizable monomer, an alkali-soluble resin, a photopolymerization initiator and a compound represented by the following formula (I): Formula (I): wherein each of R 1 and R 2 independently represents a hydrogen atom, an alkyl group having a carbon number of 1 to 20 or an aryl group having a carbon number of 6 to 20, R 1 and R 2 may be the same or different but are not a hydrogen atom at the same time, R 1 and R 2 may form a cyclic amino group together with the nitrogen atom, each of R 3 and R 4 independently represents an electron-withdrawing group, and R 3 and R 4 may combine with each other to for a cyclic electron-withdrawing group.
申请公布号 KR20100133396(A) 申请公布日期 2010.12.21
申请号 KR20107021763 申请日期 2009.03.30
申请人 FUJIFILM CORPORATION 发明人 EINAGA HIROYUKI
分类号 G03F7/004;C07C225/14;C07C233/36;C07C255/30;C07C317/44;G02B5/20;G03F7/031 主分类号 G03F7/004
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