SUBSTRATE HEATING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE UNIT

摘要

PURPOSE: A substrate heating unit and a substrate processing device thereof are provided to uniformly heat the entire surface of a substrate. CONSTITUTION: A substrate is placed on an upper plate(111a) which has different thickness along a radial direction. A lower plate(111b) is located in the lower part of the upper plate. A heating element(120) is installed in the lower plate. The heating element generates heat.