FABRICATION METHOD OF OFTOELECTRONIC DEVICE USING NANO IMPRINT LITHOGRAPHY PROCESS

摘要

PURPOSE: A fabrication method of a photoelectric device using a nano imprint lithography process is provided to form a light scattering layer having a nano-pattern on the surface of the photoelectric device by performing a nano imprint lithography process. CONSTITUTION: A sol solution including a precursor having the difference of refractive index of 0.4 from a transparent substrate and is coated on the transparent substrate(S110). A gel solution is annealed to form light scattering layer of poly-crystal(S130). A stamp having a nano-pattern and the sol solution are aligned on the transparent substrate. The stamp and transparent substrate are separated from each other.