发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <p>An object is to provide a radiation-sensitive resin composition such that little out gas is emitted from a resin film after heat-burning even when a novolac resin is used. The present invention is directed to a radiation-sensitive resin composition containing (A) a novolac resin having repeating units with a structure in which at least a methyl group, a phenyl group, or a hydroxyphenyl group is attached in place of a hydrogen atom in a methylene group combining phenols, (B) at least one thermally-reactive compound selected from the group consisting of benzoxazine compounds, carbodiimide compounds, triazinethiol compounds, and bismaleimide compounds, and (C) a radiation-sensitive compound, and an organic electroluminescent element in which an insulating film has been formed by radiation lithography by using the composition.</p>
申请公布号 KR20100133425(A) 申请公布日期 2010.12.21
申请号 KR20107022710 申请日期 2009.03.09
申请人 NAGASE CHEMTEX CORPORATION 发明人 TAKEDA TAKASHI;KOTANI NORIHISA
分类号 G03F7/004;G03F7/039;H01L51/50;H05B33/12 主分类号 G03F7/004
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