发明名称 |
Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems |
摘要 |
A method for minimizing rippling of features when imaged on a surface of a substrate using a mask. The method includes the steps of determining a deviation between a first representation of the design and a second representation of an image of the design at each of a plurality of evaluation points for each section of a plurality of sections of the design; determining an amount of modification of the design at each section based on an evaluation of the plurality of evaluation points; and modifying the design at each section by the amount determined in the previous step.
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申请公布号 |
US7856606(B2) |
申请公布日期 |
2010.12.21 |
申请号 |
US20050092983 |
申请日期 |
2005.03.30 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
EURLINGS MARKUS FRANCISCUS ANTONIUS;MULDER MELCHIOR;LAIDIG THOMAS;HOLLERBACH UWE |
分类号 |
G06F17/50;G03F1/00;G03F1/36;G03F7/20;H01L21/027 |
主分类号 |
G06F17/50 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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