发明名称 |
SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE, AND MANUFACTURING METHODS THEREOF |
摘要 |
PURPOSE: A semiconductor substrate, a semiconductor device, and a manufacturing methods thereof are provided to reduce manufacturing costs for an LED and a laser diode by using a GaN substrate. CONSTITUTION: A first semiconductor layer is formed on a substrate. A metallic material layer is formed on a semiconductor layer by a predetermined pattern. A second semiconductor layer is formed on the semiconductor layer and metallic material layer. A hollow(102a) is formed on a first semiconductor layer under the metallic material layer. |
申请公布号 |
KR20100132910(A) |
申请公布日期 |
2010.12.20 |
申请号 |
KR20100051176 |
申请日期 |
2010.05.31 |
申请人 |
SEOUL OPTO DEVICE CO., LTD. |
发明人 |
SAKAI SHIRO |
分类号 |
H01L21/20;H01L33/02 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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