发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
摘要 <p>PURPOSE: A semiconductor integrated circuit device is provided to reduce a leakage current without destroying data. CONSTITUTION: The source electrode of a first P channel type metal oxide semiconductor transistor(MP102) is connected to a power line. The source electrode of the first N channel MOS transistor(MN102) is connected to the source line. The drain electrode of the first N channel MOS transistor is connected to the drain electrode of the first P channel type metal oxide semiconductor transistor. The source electrode of the second P channel type metal oxide semiconductor transistor is connected to the power line. The source electrode of the second N channel MOS transistor is connected to the source line. The drain electrode of the second N channel MOS transistor is connected to the drain electrode of the second P channel type metal oxide semiconductor transistor. The drain electrode of the second N channel MOS transistor is connected to the gate electrode of the first N channel MOS transistor and the first P channel type.</p>
申请公布号 KR20100132937(A) 申请公布日期 2010.12.20
申请号 KR20100105198 申请日期 2010.10.27
申请人 KABUSHIKI KAISHA HITACHI SEISAKUSHO(D/B/A HITACHI, LTD.);HITACHI ULSI SYSTEMS CO., LTD. 发明人 OSADA KENICHI;ISHIBASHI KOICHIRO;SAITOH YOSHIKAZU;NISHIDA AKIO;NAKAMICHI MASARU;KITAI NAOKI
分类号 G11C11/41;G11C11/413;G11C11/412;H01L21/8234;H01L21/8238;H01L21/8244;H01L27/088;H01L27/092;H01L27/10;H01L27/11;H03K19/00 主分类号 G11C11/41
代理机构 代理人
主权项
地址