| 摘要 |
<p>PURPOSE: A plasma processing apparatus for manufacturing thin-film solar cells is provided to improve the process efficiency by minimizing the effect on the process variable by easily controlling the distance between a diffuser and a susceptor by a susceptor moving unit. CONSTITUTION: The unit chambers(140, 150) respectively include diffusers(141, 151) and susceptors(142, 152). The diffuser sprays the process gas induced from the outside of the unit chamber to the inside of the unit chamber. The partition walls(145, 146) are prepared between side walls(140c, 140d) of the unit chamber and both sides of the diffuser.</p> |
