发明名称 SPUTTERING TARGET, SINTERED BODY, CONDUCTIVE FILM FORMED BY USING THEM, ORGANIC EL DEVICE, AND SUBSTRATE USED FOR THE ORGANIC EL DEVICE
摘要 A sintered article is fabricated which contains one or more of indium oxide, zinc oxide, and tin oxide as a component thereof and contains any one or more types of metal out of hafnium oxide, tantalum oxide, lanthanide oxide, and bismuth oxide. A backing plate is attached to this sintered article to constitute a sputtering target. This sputtering target is used to fabricate a conductive film on a predetermined substrate by sputtering. This conductive film achieves a large work function while maintaining as much transparency as heretofore. This conductive film can be used to achieve an EL device or the like of improved hole injection efficiency. <IMAGE>
申请公布号 KR101002537(B1) 申请公布日期 2010.12.17
申请号 KR20057001886 申请日期 2003.05.26
申请人 发明人
分类号 C04B35/00;C23C14/34;C04B35/01;C04B35/50;C23C14/08;H01B5/14;H01L51/00;H01L51/40;H01L51/50;H01L51/52;H05B33/14 主分类号 C04B35/00
代理机构 代理人
主权项
地址