发明名称 |
SPUTTERING TARGET, SINTERED BODY, CONDUCTIVE FILM FORMED BY USING THEM, ORGANIC EL DEVICE, AND SUBSTRATE USED FOR THE ORGANIC EL DEVICE |
摘要 |
A sintered article is fabricated which contains one or more of indium oxide, zinc oxide, and tin oxide as a component thereof and contains any one or more types of metal out of hafnium oxide, tantalum oxide, lanthanide oxide, and bismuth oxide. A backing plate is attached to this sintered article to constitute a sputtering target. This sputtering target is used to fabricate a conductive film on a predetermined substrate by sputtering. This conductive film achieves a large work function while maintaining as much transparency as heretofore. This conductive film can be used to achieve an EL device or the like of improved hole injection efficiency. <IMAGE> |
申请公布号 |
KR101002537(B1) |
申请公布日期 |
2010.12.17 |
申请号 |
KR20057001886 |
申请日期 |
2003.05.26 |
申请人 |
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发明人 |
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分类号 |
C04B35/00;C23C14/34;C04B35/01;C04B35/50;C23C14/08;H01B5/14;H01L51/00;H01L51/40;H01L51/50;H01L51/52;H05B33/14 |
主分类号 |
C04B35/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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