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发明名称
Magnetron sputtering apparatus
摘要
申请公布号
KR101002052(B1)
申请公布日期
2010.12.17
申请号
KR20080070160
申请日期
2008.07.18
申请人
发明人
分类号
H01L21/203
主分类号
H01L21/203
代理机构
代理人
主权项
地址
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