ARRAY SUBSTRATE AND METHOD OF MANUFACTURING THE ARRAY SUBSTRATE

摘要

PURPOSE: An array substrate and a method for manufacturing the array substrate are provided to improve the reliability of a fabrication process by enabling a normal dry etching process through the change of an oxide film of a first device pattern into an easily vaporized fluoride film. CONSTITUTION: A gate electrode(124) is formed on a base substrate(110), and a gate insulation film(130) includes a step shape on the base substrate including the gate electrode. A semiconductor pattern is formed on the gate insulation film and has a step coverage with the gate insulation film. An ohmic contact pattern(144) is formed on the semiconductor pattern and has the identical pattern to the semiconductor pattern, excluding a channel unit.