CLEANING METHOD AND CLEANING SYSTEM OF ORGANIC MATERIALS

摘要

PURPOSE: A method for cleaning an organic and a cleaning system are provided to increase the preventive maintenance cycle of a deposition process by cleaning a mask while an organic deposition process is implemented. CONSTITUTION: A mask and a substrate are arranged in a deposition chamber(a1). An organic deposition process with respect to the substrate is repeatedly implemented(a2). The mask is transferred to a stock chamber. An organic accumulated on the mask is cleaned in the stock chamber(b). A scanning process is implemented along the boundary of a slot formed in the mask(c).