APPARATUS FOR THIN LAYER DEPOSITION

摘要

PURPOSE: An apparatus for depositing a thin film is provided to prevent the pattern error due to the temperature increase of a second nozzle since the temperature of a second nozzle frame, which gribs the second nozzle in a tensile state, is uniformly maintained. CONSTITUTION: An apparatus(100) for depositing a thin film consists of a depositing source(110), first and second nozzles(120,130) and barrier assemblies(131,132). The first and second nozzles are formed on one side of the depositing source. The first and second nozzles are arranged to face each other. The barrier assembly comprises a plurality of barriers. The barriers are arranged between the first and second nozzles. The second nozzle is arranged to be spaced from a deposited member. The barriers are arranged to slope to the moving direction of the thin film depositing apparatus.