发明名称 CMOS PIXEL WITH DUAL-ELEMENT TRANSFER GATE
摘要 Embodiments of a pixel that includes a photosensitive region, a floating diffusion region, and a transistor transfer gate disposed between the photosensitive region and the floating diffusion region. The transfer gate includes first and second transfer gate elements, the first transfer gate element having a different doping than the second transfer gate element. By controlling the doping of the first and second transfer gate elements a transfer gate can be provided with a greater threshold voltage near the photosensitive region and a lesser threshold voltage near the floating diffusion region. Other embodiments, including process embodiments, are disclosed and claimed.
申请公布号 US2010314667(A1) 申请公布日期 2010.12.16
申请号 US20100781638 申请日期 2010.05.17
申请人 OMNIVISION TECHNOLOGIES, INC. 发明人 NOZAKI HIDETOSHI;DAI TIEJUN
分类号 H01L31/112;H01L31/18 主分类号 H01L31/112
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