发明名称 |
GAS INJECTION APPARATUS FOR LARGE PROCESSING CHAMBER |
摘要 |
PURPOSE: A gas injecting apparatus is provided to absorb the thermal expansion from the center to the edge of a shower head by rotating a first ball hinge unit inserted into a gas box and a second ball hinge unit inserted into a shower head. CONSTITUTION: A shower head(10) comprises a plurality of gas injecting holes(11). A gas box(20) is installed on the upper side of the shower head. Reaction gas supplied from a gas supply source is inputted to the gas box. A conductive thin plate(44) is arranged between the edges of the shower head and the gas box. A buffering member(30) is connected to the shower head and the gas box.
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申请公布号 |
KR20100131761(A) |
申请公布日期 |
2010.12.16 |
申请号 |
KR20090050504 |
申请日期 |
2009.06.08 |
申请人 |
TES CO., LTD. |
发明人 |
JOH, KIL YOUNG;JANG, KYUNG HO |
分类号 |
H01L21/205;H01L21/3065 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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