发明名称 GAS INJECTION APPARATUS FOR LARGE PROCESSING CHAMBER
摘要 PURPOSE: A gas injecting apparatus is provided to absorb the thermal expansion from the center to the edge of a shower head by rotating a first ball hinge unit inserted into a gas box and a second ball hinge unit inserted into a shower head. CONSTITUTION: A shower head(10) comprises a plurality of gas injecting holes(11). A gas box(20) is installed on the upper side of the shower head. Reaction gas supplied from a gas supply source is inputted to the gas box. A conductive thin plate(44) is arranged between the edges of the shower head and the gas box. A buffering member(30) is connected to the shower head and the gas box.
申请公布号 KR20100131761(A) 申请公布日期 2010.12.16
申请号 KR20090050504 申请日期 2009.06.08
申请人 TES CO., LTD. 发明人 JOH, KIL YOUNG;JANG, KYUNG HO
分类号 H01L21/205;H01L21/3065 主分类号 H01L21/205
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