| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for controlling a film thickness unevenness (variation) in a substrate surface in regard to a method of manufacturing an optical element using a reduced-pressure drying method. SOLUTION: In the reduced-pressure drying apparatus including an air supply port 10 and an exhaust port 11, a variable speed plate 12 capable of changing an angle against a substrate 1 is provided above a stage 3 supporting the substrate 1. With this apparatus, flow velocity increases as it draws closer to the exhaust port 11 in a flow velocity distribution above the substrate 1, resulting in a constant concentration of solvent vapor above the substrate 1 regardless of the place or the time. Thus, the dry condition remains the same across the whole surface of the substrate 1, whereby the optical element with the reduced film thickness unevenness can be obtained. COPYRIGHT: (C)2011,JPO&INPIT
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