发明名称 OPERATION METHOD OF PLASMA TREATMENT DEVICE EQUIPPED WITH ELECTRODE SIMULTANEOUSLY RESPONSIVE TO A PLURALITY OF FREQUENCIES
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma treatment device capable of carrying out desired independent control on plasma ion energy and plasma density. <P>SOLUTION: The plasma treatment device includes: a vacuum chamber 10 equipped with a port for combining gas in the vacuum chamber 10, a first electrode 18 for applying an electric field on the gas in the vacuum chamber 10, and a second electrode 26 at a DC reference potential at an spacing from the first electrode 18, and made to excite the gas to plasma at an area including the volume between the electrodes 18, 26; and a circuit 70 for supplying to plasma at the same time the electric fields with different frequencies for the first electrode 18. The vacuum chamber 10 is so structured to make electric power with different frequencies take substantially different routes passing the area. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010282970(A) 申请公布日期 2010.12.16
申请号 JP20100135198 申请日期 2010.06.14
申请人 LAM RES CORP 发明人 VAHEDI VAHID;LOEWENHARDT PETER;ELLINGBOE BERT;KUTHI ANDY;FISCHER ANDREAS
分类号 H05H1/46;C23C16/505;C23C16/509;H01J37/32;H01L21/3065 主分类号 H05H1/46
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