发明名称 INTERNAL POWER SUPPLY CIRCUIT, SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To enable the control of the delay amount of an internal circuit of a semiconductor device after the semiconductor device is formed on a wafer. <P>SOLUTION: The internal power supply circuit 11 supplying a voltage VA to an internal circuit 12 of a semiconductor device 10 through internal power supply wiring 30A, includes: a reference potential generation circuit 16 configured to generate a plurality of reference potential sets VAREF having mutually different temperature dependency; an internal power generation circuit 15A for generating a power voltage VA using the reference potential VAREF, generated by the reference potential generation circuit 16, as criteria; and a control circuit 18 for selecting the reference potential VAREF to be generated in the reference potential generation circuit 16. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010282317(A) 申请公布日期 2010.12.16
申请号 JP20090133732 申请日期 2009.06.03
申请人 ELPIDA MEMORY INC 发明人 HAYASHI KOICHIRO
分类号 G05F1/00;G05F1/10;G05F3/30;H01L21/822;H01L27/04 主分类号 G05F1/00
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