| 摘要 |
A semiconductor device includes: a semiconductor substrate; an interlayer insulating film provided on the semiconductor substrate; an interconnect (second interconnect trench) composed of a metallic film provided in an interconnect trench (second copper interconnect) and a plug composed of a metallic film provided in a connection hole (via hole) coupled to the second interconnect trench, both of which are provided in the interlayer insulating film; a first sidewall provided on a side surface of the via hole; and a second sidewall provided on a side surface of the second interconnect trench, and a thickness of the first sidewall in vicinity of a bottom of the side surface of the via hole is larger than a thickness of the second sidewall in vicinity of a bottom of the second interconnect trench.
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