| 摘要 |
A gas mixer and sampler system (2) for a controlled atmosphere laboratory chamber (4), the mixer and sampler system has a sampler remote from the chamber and a gas supply arrangement, including a mixer (14) remote from the chamber. The sampler consists of a gas sensor arrangement (5) for sensing a first and a second gas. A processor output from the gas sensors to determine the relative concentrations of the first and second gases, and determine proportions and flow rate for gases to be supplied to the chamber to meet a determined profile. The mixer and sampler are provided externally of the chamber at a location spaced from the chamber.
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