发明名称 WAVEFRONT ABERRATION MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a measurement apparatus capable of measuring wavefront aberrations correctly and efficiently. <P>SOLUTION: The measurement apparatus which measures the wavefront aberrations of an optical system 31 to be measured includes an imaging device 53 imaging an interference fringe, including the aberration information of the optical system to be measured; a calculation unit 55a calculating the wavefront aberration, based on the interference fringe imaged by the imaging device; and a determination unit 55b, calculating the evaluation value indicating a wavefront state, based on the wavefront aberration calculated by the calculation unit and determining the calculated wavefront aberrations as the wavefront aberrations of the optical system, when the evaluation value falls within the allowable range. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010283308(A) 申请公布日期 2010.12.16
申请号 JP20090137723 申请日期 2009.06.08
申请人 CANON INC 发明人 YAMAMOTO KAZUKI;OSAKI YOSHINORI
分类号 H01L21/027;G01M11/02;G03F7/20 主分类号 H01L21/027
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