| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that exchanges multiple original plates to expose the patterns of the original plates on a substrate, improves the accuracy of alignment between the original plates and the substrate, and improves a throughput. <P>SOLUTION: The exposure apparatus for exposing the patterns of the original plates on the substrate by double patterning includes a stage that moves with the original plate placed thereon, a holding means for holding the original plate to be exposed following the original plate placed on the stage, a heating means for heating the original plate held by the holding means, and a control means for controlling the heating means. <P>COPYRIGHT: (C)2011,JPO&INPIT |
