METHOD OF MANUFACTURING METAL OXIDE THIN-FILM PATTERN, METAL OXIDE THIN-FILM, SEMICONDUCTOR, AND THIN-FILM TRANSISTOR

摘要

PROBLEM TO BE SOLVED: To provide a method of easily manufacturing a metal oxide thin-film pattern with high performance and high stability at inexpensively, and to provide a method of manufacturing a thin-film transistor using the same. SOLUTION: The method of manufacturing the metal oxide thin-film pattern in a predetermined region on a substrate includes a process of applying an ink composition containing ions of metal to become metal oxide in an ink jet manner, wherein the ink composition has a viscosity of 3 to 40 mPa s and a surface tension of 10 to 70 mN/m. COPYRIGHT: (C)2011,JPO&INPIT