发明名称 PLASMA CVD METHOD
摘要 A plasma CVD method uses an electrode array in a reaction chamber, the electrode array including a plurality of inductively coupled electrodes, each electrode being folded back at the center so that each electrode is substantially U-shaped with two parallel straight portions, the electrodes are arranged such that all of the parallel straight portions are arranged parallel to each other in a common plane, each of the electrodes having at least a portion with a diameter of 10 mm or less, and a phase controlled power supply for feeding high frequency power to the feeding portions so as to establish a standing wave of a half wavelength or natural number multiple of a half wavelength between a feeding portion and a folded back portion and between a grounded portion and the folded back portion, and is controlled to have a phase difference between adjacent two feeding portions.
申请公布号 US2010316815(A1) 申请公布日期 2010.12.16
申请号 US20100855809 申请日期 2010.08.13
申请人 ISHIKAWAJIMA-HARIMA HEAVY INDUSTRIES CO., LTD. 发明人 TAKAGI TOMOKO;UEDA MASASHI
分类号 C23C16/50;C23C16/509;H01J37/32 主分类号 C23C16/50
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