SHOWER HEAD OF CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

PURPOSE: A shower head of a chemical vapor deposition apparatus is provided to improve productivity by blocking a particle in etch cleaning in advance and reducing process failure. CONSTITUTION: A processing chamber(110) has a closed space therein. A source gas supply unit(120) supplies a source gas into a source chamber. An exhaust unit(140) discharges the gas inside a process chamber through a discharge line(130). A susceptor(150) supports the wafer of the process chamber. A shower head body(160) includes a spray holes for the source gas on top of the wafer.